权威例句
Plasma etcher with heated ash chamber baseDual excitation reactive ion etcher for low energy plasma processingEtching of aluminum alloys in the transformer‐coupled plasma etcherCharacterization of a Time Multiplexed Inductively Coupled Plasma EtcherInfluence of Coil Power on the Etching Characteristics in a High Density Plasma EtcherEtching Characteristics and Profile Control in a Time Multiplexed Inductively Coupled Plasma EtcherControl of semiconductor manufacturing equipment: real-time feedback control of a reactive ion etcherMeasurement of ion impact energy and ion flux at the rf electrode of a parallel plate reactive ion etcherThe black silicon method: a universal method for determining the parameter setting of a fluorine-based reactive ion etcher in deep s...The black silicon method: a universal method for determining the parameter setting of a fluorine-based reactive ion etcher in deep s...
